DD ISO TS 13278

DD ISO TS 13278 pdf download Nanotechnologies — Determination of elemental impurities in samples of carbon nanotubes using inductively coupled plasma mass spectrometry
1 Scope
This Technical Specification provides methods for the determination of residual elements other than carbonin samples of single-wall carbon nanotubes (SWCNTs) and multiwall carbon nanotubes(MWCNTs) usinginductively coupled plasma mass spectrometry (ICP-MS).
The purpose of this Technical Specification is to provide optimized digestion and preparation proceduresfor SWCNT and MWCNT samples in order to enable accurate and quantitative determinations of elementalimpurities using ICP-MS.
2Normative reference
The following referenced documents are indispensable for the application of this document.For datedreferences, only the edition cited applies. For undated references, the latest edition of the referenced document(including any amendments) applies.
ISO/Ts 80004-3,Nanotechnologies — Vocabulary —Part 3: Carbon nano-objects
3 Terms, definitions, symbols and abbreviations
3.1 Terms and definitions
For the purposes of this document, the terms and definitions given in ISO/TS 80004-3 and the following apply.
3.1.1
inductively coupled plasma source
device used to generate a plasma sustained in argon gas at atmospheric pressure by radiofrequencyelectromagnetic fields
3.1.2
ICP-MS
inductively coupled plasma mass spectrometry
analytical technique comprising a sample introduction system， an inductively coupled plasma source forgeneration of ions of the material(s) under investigation, a plasmalvacuum interface, and a mass spectrometercomprising an ion focusing, separation and detection system
NOTE ICP-MS permits quantitative determinations of trace， minor and major elements in samples pertaining toalmost every field of application of analytical chemistry.
3.1.3
elemental impurity
element other than carbon that is present in a sample and not in the form of carbon nanotubes
NOTE 1 Such impurities are primarily remnants of metal catalysts used during large-scale production of CNTs.
NOTE 2 Amorphous carbon can be considered another type of impurity in samples containing SWCNTs and MWCNTs,but is outside the scope of this Technical Specification.
3.2 Symbols and abbreviations
CCT collision cell technology
CVD chemical vapour deposition
DRC dynamic reaction cell
ICP-MS inductively coupled plasma mass spectrometry
ICP-AES inductively coupled plasma atomic emission spectrometry
k coverage factor
I d dilution factor of the analysed sample solution, accounting for all sample preparation steps
MWCNT multiwall carbon nanotube
M c measured concentration, in micrograms per litre, of the analysed sample solution
M s measured concentration, in micrograms per litre, in the spiked sample solution
NAA neutron activation analysis
OD outer diameter
PTFE polytetrafluoroethylene
S w weight, in grams, of CNT sample
SWCNT single-wall carbon nanotube
U expanded uncertainty
u c (y) combined standard uncertainty of the final result
u(x i ) standard uncertainty associated with input quantity, x i
V volume, in litres, of the analysed sample solution
wt % weight percentage